| 摘要 |
PURPOSE:To adsorb the rugged step of a base, to obtain a uniformly coated film at manufacturing a magnetic bubble memory element, etc. and to improve the accuracy of a fine pattern by making a substrate on which a coating solution is dropped rotatively and revolutionarily so as to carry out spin coating. CONSTITUTION:When the coating solution is spin-coated on the surface of a substrate 1, the substrate 1 on which the coating solution is dropped is caused to rotation and revolution. The center 2 of the revolution lines at the outside in the radium direction of the substrate 1 and the rotation speed of the rotation is slower then that of the revolution. An arm member 5 is caused to protrude in a rotatable rotary spindle 4 in its radium direction and the spindle neck part of a disk 6 is freely turnably fitted out in the vicinity of the projecting part of the member 5. Then a rotary wheel 8 is mounted on the spindle neck and is followed to a rotary wheel 7. Thus the size and direction of centrifugal force caused by the rotation when the coated film is formed on the substrate change in terms of a sine wave and the thickness of the coated film is unified.
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