| 摘要 |
PURPOSE:To manufacture a grain-oriented silicon steel sheet with an extremely small iron loss by forming two or more very thin tensile films of different compounds on the surface of a grain-oriented silicon steel sheet subjected to finish annealing while keeping high adhesion to the surface of the steel sheet. CONSTITUTION:Oxides on a grain-oriented silicon steel sheet subjected to finish annealing are removed, and two or more very thin tensile films of different compounds selected among the nitrides and/or carbides of Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Co, Ni, Al, B and Si and the oxides of Al, Ni, Cu, Si and Zn are successively formed on the surface of the steel sheet by CVD, ion plating or ion implantation. |
