发明名称 MAGNETRON TYPE SPUTTERING DEVICE
摘要 PURPOSE:To widen the region having desired uniformity as far as possible by combining and disposing ferromagnetic material parts and non-ferromagnetic material parts on the rear side of a target and adjusting the intensity distribution of the magnetic field near the target surface. CONSTITUTION:A magnet 4 is installed on the rear surface of a backing plate 3 fixed with the target 1. Parts 5a consisting of a ferromagnetic material such as 'Permalloy(R)' and parts 5b consisting of a non-magnetic material such as copper are suitably combined to face the magnetic poles of the magnet 4 and are disposed on the rear surface of the backing plate 3. The intensity of the magnetic field near the surface of the target 1 is locally changed by such parts 5a and 5b by which the intensity distribution of the magnetic field over the entire surface is optionally adjusted. the region having the desired uniformity is thus widened as far as possible according to all sputtering materials or all use conditions.
申请公布号 JPS61246367(A) 申请公布日期 1986.11.01
申请号 JP19850087957 申请日期 1985.04.24
申请人 NEC CORP 发明人 OZAWA TAKEO
分类号 C23C14/36;C23C14/35 主分类号 C23C14/36
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