发明名称 SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL FOR SEMICONDUCTOR LASER BEAMS
摘要 PURPOSE:To obtain a photosensitive material high in sensitivity to semiconductor laser beams and high in contrast by sensitizing a monodispersed silver halide emulsion having cubic crystal forms and contg. silver bromide in a specified content or more and no silver chloride with an IR sensitizing dye having the absorption max. in a specified IR region. CONSTITUTION:The silver halide emulsion contains the sensitizing dye having the absorption max. in 780-800nm in the IR region and its sensitivity is not changed too much in the region of said max. + or -100nm, and it is represented by the formula shown on the right in which R1, R2 are each 1-4C alkyl or sulfoalkyl, X<-> is an anion, and n is 1 or 2, and when an intramolecular salt is formed, n is 1. This silver halide emulsion contains >=95mol% silver bromide and no silver chloride, and it is composed of monodispersed cubic crystals, thus permitting the obtained photosensitive material to be given especially high sensitivity to semiconductor laser beams and good storage stability by coating a support with such a sensitized emulsion.
申请公布号 JPS61245152(A) 申请公布日期 1986.10.31
申请号 JP19850086059 申请日期 1985.04.22
申请人 ORIENTAL SHASHIN KOGYO KK 发明人 FUJINO TAMOTSU;SAWARA TAKESHI
分类号 G03C1/12;G03C1/14;G03C5/16 主分类号 G03C1/12
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