| 摘要 |
The radiation sensitive compound contains at least two groups having the structure ……A<->N@ - Ar - R - X - @ - X<1> -… in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X min which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X min is an imino group, Y represents O or S, R represents a single bond or a divalent or other polyvalent radical and A<-> is an anion. It may be produced by (i) reacting a compound containing a diazo group precursor and having one or more -OH, -SH, -NH2, -NH- groups with a compound having a plurality of -NCO, -NCS, -OCOCl, or > NOCl groups, (ii) converting the precursor as necessary into a diazo group, and (iii) reacting the diazo groups with an acid. The compound is useful for the production of radiation sensitive plates for lithographic printing plate manufacture. |
