发明名称 PARTICLE BEAM SOURCE FOR PARTICLE BEAM EPITAXIAL APPARATUS
摘要 PURPOSE:To obtain sharp particle beam, by using a thin tantalum tube as the furnace to effect the thermal decomposition of gaseous raw material, passing electrical current along the thin tantalum tube to cause generation of heat in the tube, introducing a gaseous raw material from the base end of the tube, and ejecting particle beam through the tip. CONSTITUTION:In a particle beam source furnished with a furnace to heat and decompose gaseous raw material, a thin tantalum tube 2 is used as the furnace. The thin tantalum tube 2 is heated by passing an electric current through a circuit formed by the lead-through 14, the lead 10, the thin tantalum tube 2, the lead 16 and the lead-through 18. A gaseous raw material is supplied to the base end 6 of the thin tantalum tube from the gas transfer pipe 8, and particle beam is ejected from the tip end 4 of the thin tantalum tube.
申请公布号 JPS61242990(A) 申请公布日期 1986.10.29
申请号 JP19850084039 申请日期 1985.04.18
申请人 SHIMADZU CORP 发明人 KATAYAMA YUKIAKI
分类号 C30B23/08 主分类号 C30B23/08
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