发明名称 HARD FILM AND ITS PRODUCTION
摘要 PURPOSE:To form a laminated hard film having wear resistance and long life by sputtering a carbon target by an ion beam by an inert gas in a hydrogen atmosphere then sputtering the target by an ion beam of an inert gas added with hydrogen. CONSTITUTION:The carbon target 21 is sputtered by the ion beam 23 of the inert gas such as Ar generated from an ion beam source 22 to form about 100Angstrom film. Hydrogen is then incorporated into Ar to form about 100Angstrom film. The film formation to about 100Angstrom is further continued while the hydrogen to be incorporated is gradually increased so that the entire film thickness is made about 1,000Angstrom . The hard film 11 in which the compsn. ratio of the hydrogen is graded from the substrate 12 toward the surface by the inter-diffusion of the film is thus formed. Such hard film 11 has the characteristic of large adhesive power on the substrate 12 side and has the high hardness and has the wear resistance and chemical resistance on the surface. The longer life is thus obtd.
申请公布号 JPS61243166(A) 申请公布日期 1986.10.29
申请号 JP19850082850 申请日期 1985.04.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HIROCHI KUMIKO;KITAHATA MAKOTO;YAMAZAKI OSAMU
分类号 H05K3/16;C01B31/02;C23C14/06;C23C14/46;H01L21/3205;H01L23/52 主分类号 H05K3/16
代理机构 代理人
主权项
地址