发明名称 |
Apparatus for growing GaAs single crystal by using floating zone |
摘要 |
An apparatus for growing a GaAs single crystal by relying on the floating zone technique in a cylinder charged with a GaAs polycrystal and a GaAs single seed crystal, comprising an As container communicating with the interior of the cylinder to supply an optimum vapor pressure of As into the cylinder under the condition that a continuous temperature variation is established between this As container and the GaAs crystals charged in the cylinder, whereby a GaAs single crystal having little deviation from stoichiometry and having a good crystal perfection is obtained.
|
申请公布号 |
US4619811(A) |
申请公布日期 |
1986.10.28 |
申请号 |
US19850777004 |
申请日期 |
1985.09.17 |
申请人 |
ZAIDAN HOJIN HANDOTAI KENKYU SHINKOKAI |
发明人 |
NISHIZAWA, JUN-ICHI |
分类号 |
C25D11/04;C30B13/00;C30B13/08;C30B13/20;C30B29/42;H01L21/18;(IPC1-7):C30B13/20;C30B13/28;C30B35/00 |
主分类号 |
C25D11/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|