发明名称 Apparatus for growing GaAs single crystal by using floating zone
摘要 An apparatus for growing a GaAs single crystal by relying on the floating zone technique in a cylinder charged with a GaAs polycrystal and a GaAs single seed crystal, comprising an As container communicating with the interior of the cylinder to supply an optimum vapor pressure of As into the cylinder under the condition that a continuous temperature variation is established between this As container and the GaAs crystals charged in the cylinder, whereby a GaAs single crystal having little deviation from stoichiometry and having a good crystal perfection is obtained.
申请公布号 US4619811(A) 申请公布日期 1986.10.28
申请号 US19850777004 申请日期 1985.09.17
申请人 ZAIDAN HOJIN HANDOTAI KENKYU SHINKOKAI 发明人 NISHIZAWA, JUN-ICHI
分类号 C25D11/04;C30B13/00;C30B13/08;C30B13/20;C30B29/42;H01L21/18;(IPC1-7):C30B13/20;C30B13/28;C30B35/00 主分类号 C25D11/04
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