| 摘要 |
PURPOSE:To increase photoelectric conversion efficiency, by providing a refractive index, which is larger than that of a light transmitting insulating substrate and smaller than that of a photoelectric conversion film, in a light transmitting insulating film, and providing a rough surface on the main surface of the light transmitting insulating film on the side of the photoelectric conversion film. CONSTITUTION:An insulating film 6 has a refractive index, which is larger than that of an insulating substrate 1 and smaller than that of a light transmitting electrode film 3. The surface of the light transmitting insulating film 6, which is contacted with the light transmitting electrode layer 3, has an irregular rough surface. A glass material, which has typical quantity for the insulating substrate 1, has the refractive index of about 1.45-1.60. The refractive index of the TCO of the light transmitting electrode layer is about 2.0. Therefore alumina, whose refractive index is about 1.7-1.8 within the above-described range of 1.60-2.0, is used for the insulating film 6. On the light transmitting insulating film 6 comprising Al2O3, which has the average difference in height of 400Angstrom , the light transmitting electrode layer 3 of SnO2 having the refractive index of about 2.0 is formed to a thickness of about 2,000Angstrom by a thermal CVD method. Then, the rough surface state of the light transmitting electrode layer 3 is created with almost no dispersion. Thus the photoelectric conversion efficiency can be increased. |
