发明名称 Method of manufacturing a Group II-VI semiconductor device having a PN junction
摘要 A method of manufacturing a semiconductor device by the use of a Group II-VI compound semiconductor crystal prepared by liquid growth method using a temperature difference technique under controlled vapor pressure of the crystal-constituting Group VI element. Thus, the concentration of vacancies and other defects acting as donor is reduced as compared with the concentration of the p type impurity to be introduced. This invention is suitable for producing light-emitting diodes emitting a light of short-wave lengths.
申请公布号 US4619718(A) 申请公布日期 1986.10.28
申请号 US19840628974 申请日期 1984.07.10
申请人 NISHIZAWA, JUN-ICHI 发明人 NISHIZAWA, JUN-ICHI
分类号 C30B19/04;C30B31/02;H01L21/208;H01L21/368;H01L21/383;H01L33/28;H01L33/56;(IPC1-7):H01L21/368;H01L21/388 主分类号 C30B19/04
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