发明名称 HARD THIN-FILM CONDUCTING PATH AND MANUFACTURE THEREOF
摘要 PURPOSE:To improve environment resistance, by constituting a conducting path by an insulating hard carbon thin film, and using a part of the film as the current conducting path. CONSTITUTION:On an Si substrate 1, an insulating hard carbon thin film 2 is formed. Thereafter, CO2 laser light 4 is projected. The laser light 4 is converged by a lens 5 to about 10mum. The upper part of the film is scanned with power of about 2W. A scanned track 6 is annealed and changed into a conducting film. Thus a conducting path 3 is formed. In place of the laser light 4, high speed particles can be effectively used. Since the high-speed particles can be converged to 1mum or less in comparison with the laser light, the conducting path having a minute pattern can be formed. Thus, the hard thin-film conducting path characterized by no irregularities on the surface, simple direct writing and excellent environment resistance can be obtained.
申请公布号 JPS61241945(A) 申请公布日期 1986.10.28
申请号 JP19850082867 申请日期 1985.04.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KITAHATA MAKOTO;HIROCHI KUMIKO;YAMAZAKI OSAMU
分类号 H05K3/10;C01B31/02;H01L21/3205;H01L23/52 主分类号 H05K3/10
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