发明名称 PHOTOMASK
摘要 PURPOSE:To prevent occurrence of inferior products caused by foreign matters adhering to the circuit pattern of a mask or reticle, by using a pellicle holder having such a structure that an adhesive material is applied to the inner surface of its frame. CONSTITUTION:A pair of pellicle holders 1, in each of which a pellicle film 6 is fitted to one end of its frame 5, is prepared and a pressure sensitive adhesive double coated tape 8 is fitted to a reticle 2 by contacting one surface of the tape 8 with the prescribed position of the reticle 2. In this case, the pellicle holders 1 are fitted to the surface 2a where a circuit pattern 4 is formed and back 2b where no circuit pattern is formed of the reticle 2. After the pellicle holders 1 are fitted to the reticle 2 in such a way, the reticle 2 is held in the vertical direction by means of a jig, etc. and vibrations are lightly given in the vertical direction. When the vibrations are given, foreign matters 9 adhering to the pellicle film 6 or reticle surfaces 2a and 2b drop down to the inner surface 5a of the frame 5 and fixed by an adhesive.
申请公布号 JPS61241756(A) 申请公布日期 1986.10.28
申请号 JP19850082457 申请日期 1985.04.19
申请人 HITACHI LTD 发明人 KIGUCHI YASUO
分类号 G03F1/00;G03F1/64;H01L21/027 主分类号 G03F1/00
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