| 摘要 |
PURPOSE:To increase remarkably the number of the titled mediums to be produced and to cut down remarkable on the depreciation cost of equipment by completely leaking a vacuum vessel with user of an inert gas and further adjusting the exposure time of the vacuum vessel to the atmosphere to <=15min. CONSTITUTION:A vacuum vessel is completely leaked by using an inert gas to previously adsorb the inert gas on the wall of the vacuum vessel and the adsorption of gaseous impurities (O2, H2O, etc.) can be prevented. The exposure time of the vacuum vessel to the atmosphere is controlled to <=15min and the provability of the adsorption of gaseous impurities on the vessel wall can be reduced. Consequently, evacuation is carried out in a short time, the excellent characteristic as a photomagnetic recording medium is maintained even when the sputtering is carried out at the initial low degree of vacuum and the depreciation cost of equipment can be extremely reduced in mass production.
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