| 摘要 |
PURPOSE:To effectively improve an alignment accuracy and the certainty and to further improve the through-put and the yield by providing a pattern region for the alignment on a region adjacent to a semiconductor through a straight line and increasing it. CONSTITUTION:A semiconductor device adjacent to a straight line is deformed to form an alignment region, thereby firstly increasing an alignment pattern. This is because the region for forming the alignment pattern deforms the straight line and the semiconductor device of the invention to sum the obtained regions to increase. In other words, the shape of the alignment pattern 1 is increased as compared with the conventional pattern by the alignment pattern reign 2 formed by deforming the semiconductor device of the invention to be readily align by a worker, thereby obtaining sufficient necessary size and largely improving the workability. As to an automatic alignment, a distance from a real element pattern which disables the automatic alignment is increased to reduce or eliminate a real defect. |
