| 摘要 |
PURPOSE:To improve easily the magnetic characteristic of the titled magnetic thin film by providing a conductor layer on a substrate and depositing a magnetic thin film while impressing a DC negative voltage on the conductor layer. CONSTITUTION:Chromium is deposited in 500Angstrom thickness on a substrate 2 as a conductor layer 1 by vapor deposition. Then the substrate is set in a sputtering device and a film of 'Supermalloy(R)' is deposited on the conductor layer while impressing -100V DC voltage on the conductor layer on the surface of the substrate. When the magnetic film is deposited on the substrate surface, gaseous oxygen, etc., is not taken into the film by the impression of the negative voltage on the substrate and a reverse sputtering phenomenon is also generated. Consequently, a film of inferior crystal structure is removed, a film having excellent magnetic characteristics is obtained and the effect similar to that obtained by adding heat from the outside can be microscopically obtained since thermoelectrons are generated on the substrate surface.
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