发明名称 SQUARYLIUM COMPOUND
摘要 NEW MATERIAL:The compound of formula I (R<1> is H, halogen, 1-13C alkyl or alkoxy; R<2> is H or 1-13C alkoxy; R<3> is H or 1-13C alkyl; at least one of R<1>-R<3> is above alkyl or alkoxy). USE:A charge-generation agent for electrophotography, a laser radiation absorbing material for laser-writing liquid crystal display and recording material for optical disk. It is soluble in a wide variety of solvents, gives a solution having an absorption peak wavelength of 800-900nm and has high resistance to light. PREPARATION:The compound of formula I can be produced by reacting the benz[a]azulene derivative of formula II with 3,4-dihydroxy-3-cyclobutene-1,2-dione (squaric acid) in a solvent such as alcohol, a mixture of alcohol and aromatic hydrocarbon, etc., at 90-120 deg.C.
申请公布号 JPS61238755(A) 申请公布日期 1986.10.24
申请号 JP19850081893 申请日期 1985.04.16
申请人 MITSUBISHI CHEM IND LTD 发明人 MIURA KONOE;OZAWA TETSUO;IWANAMI JUNKO
分类号 G11B7/244;B41M5/26;C07C45/00;C07C45/71;C07C49/683;C07C49/697;C07C49/747;C07C49/753;C07C67/00;C07D209/94;C07D221/16;C07D307/93;C07D333/78;C07D409/08;C09K19/32;C09K19/58;C09K19/60;G03G5/06;G11B7/24 主分类号 G11B7/244
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