| 发明名称 |
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| 摘要 |
An alignment apparatus in which alignment marks on a mask and a wafer for producing a semiconductor circuit element are photoelectrically read and the positional deviation between the two alignment marks is detected and one of the mask and the wafer is parallel-moved in accordance with the detected amount to align the mask and wafer into a predetermined positional relation. This apparatus has the function of correcting any interval error which may be present between the alignment marks. |
| 申请公布号 |
JPS6148250(B2) |
申请公布日期 |
1986.10.23 |
| 申请号 |
JP19780021765 |
申请日期 |
1978.02.27 |
| 申请人 |
CANON KK |
发明人 |
KATO JUZO;OGINO YASUO;HIRAGA RYOZO;YOSHINARI HIDEKI;TOTSUKA MASAO;KANO ICHIRO;SUZUKI AKYOSHI |
| 分类号 |
H01L21/30;G03F9/00;H01L21/027;H01L21/67;H01L21/68 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 地址 |
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