| 摘要 |
PURPOSE:To improve the characteristics of a film, the speed of formation of the film and the reproducibility and to make the quality of the film uniform by a method wherein a compound containing silicon and halogen and an activation seed produced from a compound containing oxygen are introduced into a film-forming space and an optical energy is applied thereto. CONSTITUTION:Gas supply sources 106-109 are provided in accordance with a compound containing oxygen and the number of hydrogen, a halogen compound, an inactive gas, a compound containing silicon, a compound containing carbon, a germanium compound, a compound containing an impurity element as a constituent, etc. which are used as occasion calls. A material gas for producing an activation seed, which is supplied from a gas inlet pipe 110, is activated in an activating chamber, and the activation seed produced therein is introduced into a film-forming chamber 101 through an inlet pipe 124. A light 118 directed to a desired part from an optical energy generating unit 117 is applied to a compound containing silicon and halogen and the activation seed which flow in the direction of an arrow 119, and thereby an oxygen-containing amorphous deposited film is formed on the whole or a desired part of a substrate 103. |
