发明名称 QUARTZ CONTAINER FOR VAPOR DRYING AND CLEANING OF SEMICONDUCTOR
摘要 PURPOSE:To suppress the temperature of heating by a heater low and improve safety by a method wherein a quartz container is made of high purity opaque quartz and formed into a cylinder with a bottom. CONSTITUTION:A quartz container 3 is made of high purity opaque quartz and formed into a cylinder with a bottom. By forming the quartz container 3 like this, unlike square containers, no corner part exists and unevenness of the distribution of the concentration of the vapor of isopropyl alcohol (IPA) 2 due to heat radiation from the corner part is not caused. As heat condition to IPA 2 is uniform, the temperature of heating by a heater can be suppressed lower than the temperature in the case of the square container. Therefore, safety of a vapor drying and cleaning apparatus is further improved.
申请公布号 JPS61237430(A) 申请公布日期 1986.10.22
申请号 JP19850078399 申请日期 1985.04.15
申请人 WAKOMU:KK 发明人 KUSUHARA MASAKI
分类号 B08B3/08;B01D12/00;C23G5/04;F26B21/14;H01L21/00;H01L21/304 主分类号 B08B3/08
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