| 摘要 |
PURPOSE:To contrive the improvement in resolution of infrared ray elements by a method wherein an incidence window is provided each between infrared ray elements produced by multiplication of infrared ray elements. CONSTITUTION:An insulation film 13 is formed on an epitaxial layer 11 formed on the surface of a substrate 10, and N type regions 14 are formed in the photo receiving part by ion implantation and then led out of the apertures of the film 13, resulting in the formation of electrode bumps 15. An epitaxial layer 12 formed on the back of the substrate 10 is provided with apertures 16 by etching in parts corresponding to the photo receiving parts of N type regions in the surface. The layer 12 is not permeable to infrared rays, but incident infrared rays penetrate inside the infrared ray element only through the apertures 16. Then, reflection-preventing films 17 are formed only in the apertures 16. In such a manner, infrared ray elements of high resolution for picture elements can be realized by equipment of incident infrared rays with incidence directivity to the photo receiving part of the infrared ray element. |
