| 摘要 |
PURPOSE:To attain flat pattern by forming a film with negative photo sensing material (photosensitive layer) on a substrate, irradiating the rays of light from the rear side of the substrate, applying development processing so as to reduce the step of a 'Permalloy(R)' pattern generated at the edge of a conductor pattern. CONSTITUTION:The conductor pattern 2 is formed on the bubble material substrate 1, a photosensitive polyimide 3 is coated further and the entire face of the substrate is irradiated from the rear face of the substrate by using an ultraviolet ray 4. In this case, the conductor pattern 2 shields the ultraviolet rays and the photosensitive polyimide on the conductor pattern is a nonexposed part 3'. Thus, the unexposed part is removed after development processing. The 2nd insulation film 5 is formed on the substrate after baking processing and the 'Permalloy(R)' pattern 6 is formed on the 2nd insulation film 5 finally.
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