Absorptive layer for optical lithography

摘要

Multilayer photoresist recording media containing an absorptive layer are improved by forming the absorptive layer from a composition comprising PMMA or a copolymer of methylmethacrylate and methacrylic acid, certain dyes such as hydroxyazobenzoic acid or Sudan Orange G and a suitable solvent. The dyes are insoluble in the solvent of an overlying photoresist layer. The media are substantially free of loss of resolution due to dissolution of the dye into the photoresist layer.