| 摘要 |
PURPOSE:To suppress fluctuation of evaporated amt. due to opening and closing of a shutter to a small degree and to facilitate removal of impure gas from the shutter by providing a mechanism capable of adjusting the distance between an exit port of an evaporation source and a shutter for shielding an evaporated material. CONSTITUTION:An evaporation source 8, a substrate 3 to be deposited with an evaporated material for the evaporation source 8, and a shutter 4 for shielding or not shielding the evaporated material from the evaporation source 8 are provided in a vacuum vessel 1. Further, a distance adjusting mechanism comprising magnets 6, 7 are provided to adjust the distance (d) between the exist port 80 of the evaporation source and the shutter 4. When gaseous impurity in the shutter 4 is degassed, the shutter 4 is moved to access the exit 80 of the evaporation source by driving a driven magnet 7 by moving a driving magnet 6; thus, the shutter 4 is degassed by being heated by the radiant heat from the evaporation source 8. Thereafter, the shutter is removed away from the exit port 80 of the evaporation source so as to reduce reflected radiant heat.
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