发明名称 GaAs single crystal and preparation thereof
摘要 A GaAs single crystal is disclosed containing at least one impurity selected from the group consisting of In, Al, C and S, in which fluctuation of the concentration of the impurity is less that 20% throughout the crystal from which wafers having uniform characteristics can be produced, and which may be prepared by a process comprising, at a high temperature and under high pressure, pulling up the single crystal from a raw material melt containing simple substances Ga and As or GaAs compound as well as at least one impurity while controlling the concentration of As so as to keep a distribution coefficient of the impurity in GaAs within 1+/-0.1.
申请公布号 US4618396(A) 申请公布日期 1986.10.21
申请号 US19840675400 申请日期 1984.11.27
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 SHIMODA, TAKASHI;SASAKI, MASAMI
分类号 C30B15/04;C30B15/00;C30B27/02;C30B29/42;(IPC1-7):B01J17/00;C01B27/00;C04B35/00 主分类号 C30B15/04
代理机构 代理人
主权项
地址