发明名称 |
GaAs single crystal and preparation thereof |
摘要 |
A GaAs single crystal is disclosed containing at least one impurity selected from the group consisting of In, Al, C and S, in which fluctuation of the concentration of the impurity is less that 20% throughout the crystal from which wafers having uniform characteristics can be produced, and which may be prepared by a process comprising, at a high temperature and under high pressure, pulling up the single crystal from a raw material melt containing simple substances Ga and As or GaAs compound as well as at least one impurity while controlling the concentration of As so as to keep a distribution coefficient of the impurity in GaAs within 1+/-0.1.
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申请公布号 |
US4618396(A) |
申请公布日期 |
1986.10.21 |
申请号 |
US19840675400 |
申请日期 |
1984.11.27 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
SHIMODA, TAKASHI;SASAKI, MASAMI |
分类号 |
C30B15/04;C30B15/00;C30B27/02;C30B29/42;(IPC1-7):B01J17/00;C01B27/00;C04B35/00 |
主分类号 |
C30B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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