发明名称 METHOD FOR CONTROLLING PLATING DEPOSITION IN MENISCUS COATING METHOD
摘要 PURPOSE:To adjust freely the plating metal deposition on a metallic strip in the stage of subjecting the metallic strip to metal hot dipping by a meniscus coating method by providing a gate consisting of plural divided bodies to a nozzle aperture for a plating metal and closing partially the aperture thereby controlling the passage rate of the molten metal. CONSTITUTION:The gate 3 consisting of the plural divided bodies 4 is provided to the aperture 2 of a nozzle 1 of a molten metal vessel 8 plating and the bodies 4 are made vertically slidable by means of an actuating rod 6 fixed to the upper part of the gate. The metallic strip 13 is moved upward by a deflector roll 12 in front of the aperture 2 of the nozzle 1 and is plated by the molten metal 7 for plating sucked out of the aperture 2 of the nozzle 1. Part of the bodies 4 are partially lowered by the rod 6 to close partially the space in the part of the gate 3, by which the passage rate of the molten metal for plating through the nozzle is controlled and the plating metal deposition on the metallic strip 13 is freely adjusted.
申请公布号 JPS61235550(A) 申请公布日期 1986.10.20
申请号 JP19850075947 申请日期 1985.04.10
申请人 NISSHIN STEEL CO LTD 发明人 SUMIYA JIRO;TOGAWA HIROSHI;HIROSE YUSUKE
分类号 C23C2/00;C23C2/14 主分类号 C23C2/00
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