SUBSTRATE FOR CAPILLARY COLUMN

摘要

PURPOSE:To reduce man-hour and to improve yield by forming a silicon film one surface of a plate material on which silicon can be deposited by evaporation and piercing a groove thereto. CONSTITUTION:The silicon film 2 is formed to about 21mum thickness on a glass plate 1 by a D bipolar sputtering device and a resist film 4 is formed on the film 2 deposited by evaporation on the glass plate. The groove having approximately the same width as the width of the groove formed on the film 2 is then formed on the resist film 4 by UV exposing and developing. The film 2 is then subjected to an etching treatment to be formed with the groove 3 to about 200mum width except the base film 2a of about 1mum silicon groove on the base. The resist film 4 is removed and the substrate A for a capillary column is formed. The man-hour of process is thus reduced and the yields is increased.