发明名称 PHOTODECOMPOSABLE PHOTORESIST
摘要 PURPOSE:To enable development using water, such as tap water, for a developing soln. without using an org. solvent, an aq. alkaline soln., an aq. acid soln., etc., each having a danger of causing environmental pollution, by using a photoresist composed of polyvinylpyrrolidone or a vinylpyrrolidone copolymer, and an O-quinonediazide compd. CONSTITUTION:A positive image can be formed from a positive film or a negative film by changing the kinds and mixing ratio of polyvinylpyrrolidone or a vinylpyrrolidone copolymer, and a quinonediazide compd. As the quinonediazide compd. to be used as a photosensitizer e.g., a condensate of a novolak type phenol resin with naphthquinonediazide-sulfonyl chloride, etc., are used. Polyvinylpyrrolidone or a vinylpyrrolidone copolymer are represented by formulae [ I ]and [II] in which n, m are each a polymn. degree, and X is a copolymerized unit of a vinyl type monomer, such as vinyl acetate, (meth)acrylic acid, or (meth) acrylate. Another polymer or a silane coupling agent, etc., may be added to a combination of polyvinylpyrrolidone or the vinylpyrrolidone copolymer and the quinone diazide copolymer.
申请公布号 JPS60201338(A) 申请公布日期 1985.10.11
申请号 JP19840057349 申请日期 1984.03.27
申请人 MIDORI KAGAKU KENKYUSHO:KK 发明人 TSUNODA KEIKOU
分类号 G03C1/72;C08L33/00;C08L33/02;C08L39/00;G03F7/022;G03F7/023 主分类号 G03C1/72
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