发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To produce recording media for magneto-optical storage elements in large quantities at high speed with high reproducibility when the recording media are produced by magnetron sputtering using a ferromagnetic plate target, by embedding a beltlike body of a desired material in the target at a prescribed position. CONSTITUTION:When a plate 5 of a ferromagnetic material such as Fe, Ni or Co is used as a target for sputtering in the production of photomagnetic recording media by magnetron sputtering, chips 6 or a beltlike body 8 of a rare earth element-transition metal alloy contg. at least one among Gd, Td, By and Cr is embedded in the target at a position where the target is acceleratedly consumed. The target is efficiently used without waste nd the sputtering efficiency is enhanced.
申请公布号 JPS61231168(A) 申请公布日期 1986.10.15
申请号 JP19850070412 申请日期 1985.04.03
申请人 SHARP CORP 发明人 SAEGUSA MICHINOBU;MURAKAMI YOSHITERU;TAKAHASHI AKIRA;OOTA KENJI;KATO SHOSHICHI
分类号 C23C14/36;C23C14/35;G11B11/10;G11B11/105 主分类号 C23C14/36
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