| 摘要 |
PURPOSE:To operate and conserve each treating chamber independently, by forming ultrahigh vacuum treating apparatus with the first and second treating chambers and a load lock chamber and connecting the first and second ultrahigh vacuum treating chambers with two valves and intermediate vacuum vessel. CONSTITUTION:Ultrahigh vacuum apparatus for operations such as vapor deposition, film piling, etching is composed of the first and second treating chambers 41 and 42 and the load lock chamber 43. The chambers 41, 42 are connected with a small vacuum chamber 45 providing valves 44, 44' at both ends. Material to be treated is moved from the chamber 43 to the chambers 42, 41 in order, and subjected to operation such as vapor deposition. In this case, since the chambers 41, 42 are formed with respective different systems 46, 47, repair of both treating chambers and ultrahigh vacuum treatment by burning exhausting together with heating thereafter can be carried out independently. Consequently, operation and conservation of the ultrahigh vacuum treating apparatus are easy, and the operability is improved remarkably.
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