发明名称 SPUTTERING METHOD
摘要 PURPOSE:To prevent the sticking of an electrically nonconductive deposit on the surface of a magnetic recording medium formed on a substrate by magnetron sputtering by changing the directions of the magnetic poles of a permanent magnet built in a target before the recording medium is formed. CONSTITUTION:A nonmagnetic Al substrate 23 is set in an airtight vessel 21, an Fe-base target 25 is placed opposite to the substrate 23, and after the vessel 21 is evacuated, Ar and O2 are introduced into the vessel 21 from a pipe 27 as gas for sputtering in 1:1 volume ratio. A permanent magnet 28 built in the central part of the target 25 is turned so that the directions of the magnetic poles are made parallel to the surface 25A of the target 25 and high voltage is applied between the substrate 23 and the target 25 to clean the surface 25A. The magnet 28 is then turned so that the directions of the magnetic poles are made perpendicular to the surface 25A, and sputtering is carried out to form a magnetic recording medium.
申请公布号 JPS61231169(A) 申请公布日期 1986.10.15
申请号 JP19850070687 申请日期 1985.04.02
申请人 FUJITSU LTD 发明人 KANDA HIDEKAZU;WAKAMATSU HIROAKI;KIUCHI KATSUMI;NAKAGAWA KATSUHIKO
分类号 C23C14/36;C23C14/35;G11B5/85;G11B5/851 主分类号 C23C14/36
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