| 摘要 |
PURPOSE:To change the presence ratio of isotope in a collected substance with respect to a starting substance, by allowing discharged particles obtained from a substance containing an isotope to collide with gas molecules having a definite range of mass before collecting the discharged particles. CONSTITUTION:The atoms or molecules of a starting substance containing an element having an isotope are discharged to a space where dilute gas, for example, Ar is present by a sputtering method and discharged particles are collided with gaseous molecules to change the distribution state of the isotope in the gas prior to collecting said discharged particles. Concretely, the combination of the discharged particles and the gaseous molecules is set to potassium and argon and, as the starting substance 10, potassium chloride crystal particles are used and the alteration of the presence ratio of the isotope is performed by an apparatus equipped with a vacuum evacuation apparatus 1, a vacuum container 2, a sputtering target electrode 3, an opposed electrode 4, a gas introducing apparatus 5, a vacuum gauge 6 and a potassium collecting substrate 7.
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