发明名称 CONTINUOUS DOWN FEEDING OF SEMI-CONDUCTOR WAFER ON AUTOMATIC PLANE GRINDING MACHINE
摘要 PURPOSE:To eliminate thermal stress generated by volume change or grinding frictional heat on the basis of grinding resistance or property change in grinding by fine setting the sinking speed of a diamond grinding wheel continuous by and steplessly by the continuous down-feed method. CONSTITUTION:A wafer is attracted to six chucks 9 set by six-divided frame of a rotary table 8. The rotary table 8 rotates intermittently at a slow speed at 1/6 turn steps. In the chuck position 9b, a diamond grinding wheel fixed to a cup wheel 11 at the bottom of a rotating spindle 10 sinks from above automatically to start course grinding. In the chuck positions 9c and 9d, prefinish and finish grindings are performed, respectively. These grinding in chuck position 9b, 9c, 9d are made by the continuous down-feed system at 0.01mum-0.3mm/ min.
申请公布号 JPS61230853(A) 申请公布日期 1986.10.15
申请号 JP19850069126 申请日期 1985.04.03
申请人 SHIBAYAMA KIKAI KK 发明人 KOBAYASHI KAZUO
分类号 B24B7/22;B24B47/20 主分类号 B24B7/22
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