发明名称 |
PROCESS FOR MANUFACTURING BORON-DOPED GALLIUM ARSENIDE SINGLE CRYSTAL |
摘要 |
A process for manufacturing boron-doped GaAs single crystals which comprises preparing a mixture of boron, gallium and arsenic covered by a liquid B2O3 encapsulant, melting the mixture, pulling up boron-doped GaAs crystals from the mixture melts in accordance with the LEC method, crushing those crystals into small pieces after removing the seed end therefrom, remelting those pieces in the presence of B2O3, and pulling up single crystals from the mixture melts in accordance with the LEC method. |
申请公布号 |
CA1212599(A) |
申请公布日期 |
1986.10.14 |
申请号 |
CA19830425974 |
申请日期 |
1983.04.15 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD.;NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
发明人 |
MIYAZAWA, SHINTARO;NANISHI, YASUSHI;TADA, KOHJI;KAWASAKI, AKIHISA;KOTANI, TOSHIHIRO |
分类号 |
C30B27/02;C30B29/42;H01L21/18;H01L21/208 |
主分类号 |
C30B27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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