发明名称 VAPOR GROWTH METHOD
摘要 PURPOSE:To prevent the fluctuations in the form of flow, the quantity of flow and the pressure of gas by a method wherein, when the quantity of the first gas to be fed to a reaction furnace is changed, the quantity of the second gas to be fed to the reaction furnace is changed in such a manner that the total quantity of the flow of gas running in the reaction furnace is unchanged. CONSTITUTION:After an InP substrate 1 is placed in a reaction furnace 2, the hydrogen gas for which flow rate is controlled by a mass-flow 3 is supplied by a main gas line 4, and hydrogen gas is replaced in the reaction furnace 2. Besides, the hydrogen gas 101 the flow rate of which is controlled by a mass-flow 3 is fed into the reaction furnace 2 from a III-group element feeding line 6, and the hydrogen gas 102 the flow rate of which is controlled by a mass-flow 7 is fed into the reaction furnace 2 from a V-group element feeding line 8. When the temperature of the substrate reaches the prescribed value, PH3 is fed into the reaction furnace 2 through the line 8 by controlling the flow rate of gas with a mass-flow 11. At the same time, gas 102 is fed by reducing the component of the feeding quantity of PH3. Accordingly, the quantity of flow of the gas fed into the reaction furnace from the line 8 is not changed, and no fluctuation is given to the form of flow, the quantity of flow and the pressure of the gas.
申请公布号 JPS61229321(A) 申请公布日期 1986.10.13
申请号 JP19850070254 申请日期 1985.04.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MORIZAKI MOTOJI;OGURA MOTOTSUGU
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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