发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To form a lithographic plate prevented from staining by using a polymer composed of units derived from a monomer having an alcoholic OH or phenolic OH, and a monomer having a COOH and having a specified ratio of its number average mol.wt. to its weight average mol.wt. CONSTITUTION:The polymer contains repeating units derived from a monomer having an alcoholic OH, preferably, such as 2-hydroxyethyl (meth)acrylate, or a monomer having a phenolic OH, preferably, such as N-(4- hydroxyphenyl)-(meth)acrylamide, in the molecular structure, and a monomer having a COOH. The polymer, preferably, has a weight average mol.wt. of 1.50X10<4>-4.00X10<4> and a dispersion ratio of <=3, and it is contained in an amt. of 40-97wt% of the total weight of the photosensitive compsn.
申请公布号 JPS61228438(A) 申请公布日期 1986.10.11
申请号 JP19850068437 申请日期 1985.04.02
申请人 KONISHIROKU PHOTO IND CO LTD;MITSUBISHI CHEM IND LTD 发明人 GOTO SEI;SUZUKI NORIHITO;TOMIYASU HIROSHI;MAEDA YOSHIHIRO
分类号 G03F7/027;C08F2/38;C08F20/00;C08F20/26;C08F20/52;C08F220/00;C08F220/28;C08F220/52;G03F7/004;G03F7/038 主分类号 G03F7/027
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