| 摘要 |
PURPOSE:To obtain the thin film magnetic head with a highly accurate gap depth by forming a special element out of the element group as an artificial thin film head without providing the upper part magnetic pole layer and making the artificial thin film head element into a marker for polishing in the substrate polishing process. CONSTITUTION:On a unit substrate block 23 parted from the substrate, regular thin film magnetic element groups 21A, 21B... composed of a thin film coil, a magneitc pole layer, etc., and at both sides, artificial thin film head elements 22A and 22B are formed. After a lower part magnetic pole layer 32 is formed on a non-magneitc substrate 31 corresponding to a substrate block 23, a gap layer 33 is formed. A photo resist is hardened by heat, a lower part insulating layer 34 is formed, and on this, a thin film coil 35 and an upper part insulating layer 36 is formed. Next, after the photo resist film is applied over the whole surface on the substrate 31 having the artificial thin film heat elements 22A and 22B and unfinished thin film magnetic head element groups 21A, 21B..., the upper part magnetic pole layer is formed on the unfinished thin film magnetic head element while the photo resist film on the place to form the artificial thin film head elements 22A and 22B remains. |
