| 摘要 |
PURPOSE:To prevent the deterioration of a photomagnetic recording film by an oxide film and to maintain the adhesiveness to a medium substrate by forming the inorg. oxide film, nitride film and photomagnetic recording film in this order on the medium surface and forming successively the nitride film and oxide film on the recording film. CONSTITUTION:The oxide film 3 consisting of the inorg. material such as SiO2, TiO2, CrO2 or Al2O3 is deposited and formed on one surface of the medium substrate 1, then the nitride film 3 consisting of the inorg. material such as Si3N4, AlN, BN or TiN is formed thereon. The photomagnetic recording film 4 consisting of a TBFe alloy, etc. is formed thereon and further the nitride film 5 and oxide film 6 are successively formed on the film 4. The oxide film 2, the nitride film 3, the photomagnetic recording film 4, the nitride film 5 and the oxide film 6 are formed respectively to several hundreds Angstrom thickness by a vacuum deposition or sputtering method. The nitride films 3, 5 among the deposited films formed successively on the substrate 1 are deposited in order to prevent the oxidation of the film 4. The oxide film 2, 6 are deposited in order to improve the adhesive power of the film 4 to the substrate 1. |
