Electron beam test probe for integrated-circuit testing.

摘要

An electron beam test probe apparatus and a method for use of said apparatus enable measurement to be less sensitive than prior art systems to local electric fields in the vicinity of the point at which the potential of the specimen is being measured. The apparatus consists of an electron beam for bombarding the specimen at the point at which the potential of the specimen is to be measured, a magnetic lens for collimating the secondary electrons emitted from the specimen in response to this bombardment, and a detector system for measuring the energy distribution of the secondary electrons so collimated. The apparatus may be used to produce an image of the specimen in the vicinity of the point under bombardment while measuring the potential at said point. The methods taught that were disclosed allow the measurement of the potential on buried conductors located beneath an insulating layer. These methods also prevent drift in the electron beam resulting from varying surface electric fields on the specimen.