APPARATUS FOR THE COATING OF A SUBSTRATE BY PLASMA CVD OR CATHODIC SPUTTERING, PROCESS USING THIS APPARATUS AND APPLICATION OF THIS PROCESS TO THE MANUFACTURE OF A THIN FILM STRAIN GAGE SYSTEM,申请号EP19850200054-传众专利搜索

发明名称	APPARATUS FOR THE COATING OF A SUBSTRATE BY PLASMA CVD OR CATHODIC SPUTTERING, PROCESS USING THIS APPARATUS AND APPLICATION OF THIS PROCESS TO THE MANUFACTURE OF A THIN FILM STRAIN GAGE SYSTEM
摘要
申请公布号	EP0150878(A3)	申请公布日期	1986.10.08
申请号	EP19850200054	申请日期	1985.01.21
申请人	PHILIPS PATENTVERWALTUNG GMBH;N.V. PHILIPS' GLOEILAMPENFABRIEKEN	发明人	BRINGMANN, UDO;DREWS, KLAUS;SCHON, DETLEF GERD, DR.;DOSSEL, OLAF HELMUT, DR.;GERSTENBERG, KLAUS WOLFGANG, DR.;KURSTEN, GERHARD;ORLOWSKI, REINER UWE, DR.
分类号	C23C14/34;C23C16/50;C23C16/509;G01L1/22;H01J37/32;H01J37/34;H01L21/00;(IPC1-7):C23C16/50	主分类号	C23C14/34
代理机构		代理人
主权项
地址