发明名称 FILM-FORMING DEVICE
摘要 PURPOSE:To realize an effective use of metastable excited molecules, by performing a preferential reaction of non-thermally dissociative gases and metastable excited molecules in several reactive gases. CONSTITUTION:Reactive gases, leaking from the first reactive gas source 6 through a tube 13, react with metastable excited molecules (atoms) flowing through a tube 12, just before flowing into a reaction chamber 1 (near the branch point 11 of the tube). Resultantly, part of the reactive gases supplied from the first reactive gas source 6 flows into the reactive chamber 1 in a non-reactive state, and the greater part of them flows as reactive products of reactive gases. On the other hand, reactive gases leaking from the second reactive gas source 7 directly flow into the reactive chamber 1 through the valve 10, either react with metastable excited molecules (atoms), which flow into the reactive chamber 1 in a non-reactive state, of those molecules (atoms) generated at a generation part 5, or is decomposed by a heating effect of a heater 14, so that a thin film, containing both reactive gas components, is formed on the surface of the substrate 2.
申请公布号 JPS61226917(A) 申请公布日期 1986.10.08
申请号 JP19850066472 申请日期 1985.04.01
申请人 HITACHI LTD 发明人 TSUJII KANJI;YAJIMA YUSUKE;MURAYAMA SEIICHI
分类号 H01L21/205;H01L21/263;H01L21/302;H01L21/3065 主分类号 H01L21/205
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