发明名称 HIGH-SPEED SEMICONDUCTOR DEVICE
摘要 PURPOSE:To maintain high-speed properties by forming a collector-side potential- barrier layer composed of a substance, potential-energy difference thereof between a lower lever and an upper lever is larger than (AlGa)As. CONSTITUTION:A collector-side potential-barrier layer 34 is formed by InP, and a base layer 35 is constituted by InGaAs in order to lattice-match with the layer 34. Since potential-energy difference between valleys consisting of InP such as potential-energy difference between a GAMMA valley and an L valley normally takes 0.54[eV] and is far higher than that in (AlGa)As, possibility of which hot-electrons passing through the base layer 35 are subject to an inter- valley scattering in a collector-side potential-barrier layer 36 and are transitted to the L valley from the GAMMA valley is eliminated completely, thus making transit time shorter than a high-speed semiconductor device. Accordingly, a HET having high speed properties can be acquired.
申请公布号 JPS61226961(A) 申请公布日期 1986.10.08
申请号 JP19850066667 申请日期 1985.04.01
申请人 FUJITSU LTD 发明人 YOKOYAMA NAOKI;ONISHI HIROAKI;IMAMURA KENICHI;KOMENO JUNJI
分类号 H01L29/205;H01L29/68;H01L29/76 主分类号 H01L29/205
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