Method of depositing semiconductor films by free radical generation
摘要
A method of depositing a semiconductor alloy film onto a substrate by activating groups of free radicals and incorporating desired ones of the activated groups into the film.
申请公布号
US4615905(A)
申请公布日期
1986.10.07
申请号
US19850725616
申请日期
1985.04.22
申请人
ENERGY CONVERSION DEVICES INC
发明人
OVSHINSKY, STANFORD R.;ALLRED, DAVID D.;WALTER, LEE;HUDGENS, STEPHEN J.
