发明名称 SURFACE PROCESSOR FOR SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To enable the title processor to be miniaturized while attaining the reducing of processing time and the improvement in chemical consumption CONSTITUTION:When a heater 3 is lowered to mount a semiconductor substrate 1 on the surface of an electric heating plate 3a and then lifted to close the.
申请公布号 JPS61224422(A) 申请公布日期 1986.10.06
申请号 JP19850065434 申请日期 1985.03.29
申请人 TOSHIBA CORP 发明人 ROKUSHIYA TERUMI
分类号 G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/30
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