发明名称 ION BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To produce the title equipment the focus adjustment of which is easy or needless in case an ion beam is deflected by a method wherein the equipment CONSTITUTION:When the ion beam irradiating a material 14 is deflected by the first deflector 18 to make an angle of, e.g., 7 deg. with an optical axis O, the.
申请公布号 JPS61224419(A) 申请公布日期 1986.10.06
申请号 JP19850065829 申请日期 1985.03.29
申请人 JEOL LTD 发明人 SAWARAGI HIROSHI;SAKUMA YOSHIZO
分类号 H01J37/317;H01J37/305;H01L21/027;H01L21/30 主分类号 H01J37/317
代理机构 代理人
主权项
地址