| 摘要 |
PURPOSE:To obtain uniform film thickness and film quality on the surface of a substrate by sloping the supply hole side and discharge hole side of a susceptor holder and bringing the upper surface section of the susceptor holder, to which a housing recessed section for a susceptor is formed, and the height of the upper surface section of the susceptor to the same level. CONSTITUTION:The upper surfaces of a susceptor 13 and a susceptor holder 11 are formed in the same surface under the state in which the rectangular susceptor 13 on which substrates 12 are placed is housed in a recessed section shaped to the susceptor holder 11 manufactured by the quality of a material different from the susceptor 13. Inclinations 15, 16 are formed on the upstream side and downstream side of a reaction gas flow in the susceptor holder 11, thus smoothing the flow of a reaction gas. Accordingly, grown film thickness having excellent uniformity is shaped onto the substrate 12. |
