| 摘要 |
PURPOSE:To simplify the control of conditions of the formation of a film by introducing an active species through a transport space communicated with a film forming space and a precursor through another transport space, which is formed in the transport space and communicated with the film forming space, into the film forming space respectively. CONSTITUTION:An active seed is formed in an activating space 202, an upstream thereof is communicated with a transport space A, and a precursor in a precursor- change space, an upstream thereof is communicated with a transport space B, respectively, and the active species through the transport space A and the precursor through the transport space B are introduced into a film forming space respectively. The active species chemically interacts with the precursor, which is introduced into the film forming space from the transport space B at the same time as a deposit-film is shaped in the film forming space and contains the main constituent elements of the deposit film, thus easily forming the desired deposit film on a desired substrate. The film forming space and both the activating space and the precursor-change space are separated individually, and plasma discharge is not utilized in the film forming space, thus facilitating the control of conditions of the formation of the film and the control of the quality of the film. |
