| 发明名称 |
High contrast, high resolution deep ultraviolet lithographic resists. |
| 摘要 |
<p>A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.</p> |
| 申请公布号 |
EP0195986(A2) |
申请公布日期 |
1986.10.01 |
| 申请号 |
EP19860103438 |
申请日期 |
1986.03.14 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CLECAK, NICHOLAS JEFFRIES;GRANT, BARBARA DIANNE;MILLER, ROBERT DENNIS;TOMPKINS, TERRY CADY;WILLSON, CARLTON GRANT |
| 分类号 |
C08L101/00;C08K5/00;C08K5/53;C08L33/00;C08L33/02;C08L61/10;G03C1/72;G03C5/16;G03F7/016;G03F7/038;G03F7/039;G03F7/20;H01L21/027;(IPC1-7):G03F7/10 |
主分类号 |
C08L101/00 |
| 代理机构 |
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代理人 |
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| 地址 |
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