发明名称 |
METHOD OF MANUFACTURING FINELY STRUCTURED METAL PATTERNS ON METAL OR SEMICONDUCTOR SURFACES |
摘要 |
<p>Manufacture of metal patterns on the surface of a substrate consisting of metal or a semiconductor compound while using a mask selected from SiO2 or Si3N4 which is first provided uniformly on the substrate from the vapour phase and is then etched away locally. The exposed parts are metallized by means of an electroless plating bath, if desired after a separate deposition of nuclei.</p> |
申请公布号 |
EP0094711(B1) |
申请公布日期 |
1986.10.01 |
申请号 |
EP19830200653 |
申请日期 |
1983.05.06 |
申请人 |
N.V. PHILIPS' GLOEILAMPENFABRIEKEN |
发明人 |
MOLENAAR, ARIAN;VAN DEN BEEMT, JOHANNES ANDREAS CLEMENS |
分类号 |
C23C18/16;C23C18/31;H01L21/288;(IPC1-7):C23C18/54 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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