发明名称 POLISHING METHOD
摘要 PURPOSE:To enable polish to be precisely finished with high efficiency by polishing a mixture having bendolar or funicular region in which grains and liquid are filled and mixed with a polishing layer obtained by dry or semi-dry system molding. CONSTITUTION:About 1-30mum of grains like diamond and liquid like water or alkali solution are filled and mixed. The mixture is polished by the use of abrasives molded by dry or semi-dry system compression. Then, the filled and mixed condition is made of bendolar region in which liquid is annularly discretely attached around the contact points of grains while an air layer continuously exists or funicular region in which liquid is enclosed by surfaces containing the contact points of grains and exists continuously while the air layer discretely exists. Thus, in the polished cylinder 2B made of acryl resin, a grid 1 is projected over the whole polishing surface 3B as it is and even in the peripheral edge the line 1'' of the grid 1 is projected approximately as straight line. Thus, precise finish polishing can be performed with high efficiency.
申请公布号 JPS61219565(A) 申请公布日期 1986.09.29
申请号 JP19850056166 申请日期 1985.03.22
申请人 TAIHOO KOGYO KK 发明人 TANI YASUHIRO;KAWADA KENJI
分类号 B24B1/00;B24B37/00;B24B53/00 主分类号 B24B1/00
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