发明名称 REINFORCING METHOD FOR VAPOR DEPOSITION FILM
摘要 PURPOSE:To remarkably improve the adhesive strength of vapor deposition film to a substrate by vapor-depositing a metal or a metallic compound on a heat-resisting substrate such as fluororesin, ceramic, etc., by allowing a suspension of fluororesin to adhere onto it and then by carrying out heat treatment. CONSTITUTION:The metal or metallic compound is vapor-deposited on the heat-resisting substrate such as fluororesin (e.g. ethylene tetrafluoride-propylene hexafluoride copolymer), ceramic (e.g. alumina), etc., by a vacuum deposition or sputtering method; the above metal is, for example, gold, silver, etc., and compounds thereof. Subsequently the suspension of fluororesin (e.g. said fluororesin) in water or in an organic solvent is allowed to adhere on the obtained vapor deposition film, by spraying, dipping or another method and is then subjected to heat treatment. In this way, the adhesive strength of vapor deposition film of the above metal or metallic compound to the substrate can be effectively increased.
申请公布号 JPS61217574(A) 申请公布日期 1986.09.27
申请号 JP19850059304 申请日期 1985.03.22
申请人 JAPAN STORAGE BATTERY CO LTD 发明人 FUJITA YUKO;KUDO HISASHI
分类号 C23C14/58 主分类号 C23C14/58
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